| Effect of pulsing current on ZnO thin films microstructure synthesized by anodization |
| Paper ID : 1686-UFGNSM-FULL |
| Authors: |
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Misagh khanlarian1, Mohammad Heshmat2, Fereshteh Rashchi *1 1University of Tehran 2School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, P.O. Box: 11155–4563, Tehran, Iran |
| Abstract: |
| In this research, the ZnO thin films were synthesized using anodic oxidation method. The basic solution of NaOH containing NH4Cl as an additive were used for the process. The effect of pulsing current on the microstructure of the obtained thin films has been studied. Characterization was performed using x-ray diffraction (XRD) and Field Emission Scanning Electron Microscopy (FESEM). Nanostructured thin film has been obtained with nano-sized morphology. The frequency and duty cycle of the process were kept constant while the Ton, Toff, and Trev were adjusted according to the experimental design conducted by DX7 software. The results showed that the morphology of synthesized films was relatively the same for all the samples, different pulsing conditions led to different crystallite sizes which were optimized by D-Optimal design. The optimum conditions to minimize the crystallite size was calculated to be ton = 10, toff = 5, trev = 5 ms. In this research, the ZnO thin films were synthesized using anodic oxidation method. The basic solution of NaOH containing NH4Cl as an additive were used for the process. The effect of pulsing current on the microstructure of the obtained thin films has been studied. Characterization was performed using x-ray diffraction (XRD) and Field Emission Scanning Electron Microscopy (FESEM). Nanostructured thin film has been obtained with nano-sized morphology. The frequency and duty cycle of the process were kept constant while the Ton, Toff, and Trev were adjusted according to the experimental design conducted by DX7 software. The results showed that the morphology of synthesized films was relatively the same for all the samples, different pulsing conditions led to different crystallite sizes which were optimized by D-Optimal design. The optimum conditions to minimize the crystallite size was calculated to be ton = 10, toff = 5, trev = 5 ms. |
| Keywords: |
| Anodization, Thin film, Zinc oxide, Pulsing current, D-Optimal design |
| Status : Paper Accepted (Poster Presentation) |
